Shore Capital restated their buy rating on shares of Oxford Instruments (LON:OXIG – Free Report) in a research report report published on Wednesday, MarketBeat.com reports.
Oxford Instruments Price Performance
OXIG stock opened at GBX 2,125 ($27.75) on Wednesday. The firm has a 50-day moving average of GBX 2,147.68 and a two-hundred day moving average of GBX 2,303.21. Oxford Instruments has a one year low of GBX 1,634 ($21.34) and a one year high of GBX 2,765 ($36.11). The company has a current ratio of 1.64, a quick ratio of 1.11 and a debt-to-equity ratio of 12.96. The firm has a market capitalization of £1.23 billion, a PE ratio of 2,470.93, a P/E/G ratio of -3.56 and a beta of 0.96.
Insider Buying and Selling at Oxford Instruments
In other news, insider Richard Tyson purchased 5,821 shares of the firm’s stock in a transaction on Wednesday, July 24th. The stock was bought at an average cost of GBX 2,420 ($31.60) per share, for a total transaction of £140,868.20 ($183,949.07). In related news, insider Richard Tyson purchased 5,821 shares of Oxford Instruments stock in a transaction on Wednesday, July 24th. The stock was purchased at an average cost of GBX 2,420 ($31.60) per share, with a total value of £140,868.20 ($183,949.07). Also, insider Gavin Hill sold 25,000 shares of the stock in a transaction dated Wednesday, August 7th. The shares were sold at an average price of GBX 2,274 ($29.69), for a total transaction of £568,500 ($742,360.93). Insiders have purchased a total of 5,842 shares of company stock worth $14,132,971 over the last 90 days. Insiders own 4.98% of the company’s stock.
Oxford Instruments Company Profile
Oxford Instruments plc provide scientific technology products and services for academic and commercial organizations worldwide. It operates through three segments: Materials & Characterisation, Research & Discovery, and Service & Healthcare. The company offers atomic force, electron, and Raman microscopy; deposition tools comprising plasma enhanced chemical vapour deposition, chemical vapour deposition, inductively coupled plasma chemical vapour deposition, atomic layer deposition, and ion beam deposition systems; and etch tools, including inductively coupled plasma etching, reactive ion etching, deep silicon etching, atomic layer etching, and ion beam etching systems.
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